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  1. MultiCPM - Simultaneous Real Time Multi-Chamber - Multi diagnosis monitor

    The MULTISEM design concept is based on an open parallel architecture consisting of a central supervisor control unit, and a network of analytical substations
    plasma2
    etch1
    OES1
    Sofie1
    endpoint1
    interferometry1
    Horiba1
    interferometers1
    plasma etch1
    Jobin Yvon1
    end point1
    dry etching1
    optical emission1
    optical emission spectroscopy1
    dry etch1
    thin film characterisation1
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    plasma monitoring1
    endpoint detection1
    plasma characterization1
    thin film measurements1
    deposition rate1
    end point detectors1
    endpointer1
    end pointer1
    end point systems1
    endpoint systems1
    etch rate1
    thin film monitors1
    Digitwin0
    plasma characterisation0

    www.multisem.com - 2009-02-13

  2. DIGILEM - Interferometric Endpoint Detector & Thin Film Monitor

    Interferometry is a powerful technique that can be used for endpoint detection of planar layer and trench etching, or deposition
    plasma2
    semiconductor2
    semiconductors2
    deposition2
    etch1
    interference1
    Sofie1
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    interferometry1
    film thickness1
    interferometers1
    plasma etch1
    end point1
    dry etching1
    thickness monitors1
    dry etch1
    thin film characterisation1
    end point detection1
    endpoint detection1
    thin film measurements1
    deposition rate1
    end point detectors1
    endpointer1
    end pointer1
    end point systems1
    endpoint systems1
    etch rate1
    thin film monitors1
    Digilem0
    etching control0
    semiconductor characterisation0

    www.digilem.com - 2009-02-08

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